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Increasing the Practical Resolution of Projection Lithography Using a Phase-Shifting Mask
Eric M. Apelgren

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Bilayer E-Beam/DUV Resist Systems
James Baccaro

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Studies of Chlorinated Oxides
Jeffrey J. Ballak

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Micromachining: The Fabrication of a Micromotor
Brian C. Barker

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Bi-Layer Deep UV Resist System
Mark A. Boehm

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Processing Techniques of MOS Capacitors
Michael D. Buczkowski

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Performance Characterization of a GCA 4800 Stepper
John M. Coniff

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Reactive Ion Etching of Silicon Dioxide Using Both Oxygen and Carbon Dioxide as Gas Additives
James E. Constantino

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Design and Construction of a Step Etching Instrument
Robert L. Crandall

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Design, Manufacture and Testing of a 4-Bit Microprocessor
Theodore D'Antonoli

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The Use of a Water Contrast Enhancement Material for Lithographic Improvement
David A. DeMuynck

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Investigation of Process Induced Defects Using a LTO Process
Joseph DeSantis

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Evaluation of an Enhancement PMOS Operational Amplifier
Hung Q. Doan

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Dyed Resist Study
Jennifer L. Dunbar

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Selective Etching of LPCVD Si3N4 Over Si02 Using SF6
Gregg D. Espin

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Polysilicon vs. Aluminum Gate PMOS Ring Oscillators
Kurt E. Gerber

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A Diagnostic Test Chip for NMOS Processing
William Gross

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Design and Construction of a Noncontact Resistivity Measurement Instrument
William R. Hamilton

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Comparison of PMOS Transistor Source/Drain Doping: Ion Impantation Versus Solid Diffusion Source
Russell W. Heller

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The Impact of Submicron 10x Reticle Defects on Images Printed with a 0.28 NA G-Line Stepper
Karl D. Hirschman

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Reactive Ion Etching of Aluminum on the Plasmatrac 2406
Asadd M. Hosein

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Capacitance-Voltage Characterization for Polysilicon Gate MOS Capacitors
Brian Izzio

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Microfabrication of Field Emitter Tips for Vacuum Microelectronic Devices
Joseph A. Johnson

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The Affects of High Temperature Steps on Bow, Warp and Slip of a Wafer
Mark Klare

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Performing C-T Measurements
James Krawiecki

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Silicon Dioxide to Polysilicon Selectivity of a C2F6/CHF3 Dry Etch Process
Craig L. Kuhl

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GaAs MESFET Logic
Dave Petzold

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Device Fabrication Using a Double Level Polysilicon Self-Aligned PMOS Process
Sally A. Plevniak

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Standard Cell Realization for the Mentor Graphics CAD Environment
Bion Pohl

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Process Modeling of Solid Source Phosphorus Diffusions Using SUPREM-III
Craig R. Printy

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Multilevel Metalization
Matthew D. Quinn

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Development of a Photosensitive Polyimide Process
William Reinisch

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Spin on Glass Etch Processing for the RIT NMOS Process
William Roberts

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Design and Fabrication of a PN Junction Photodiode Array
Richard Rogoff

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Calibration and Characterization of a Resist Process through Linewidth Measurement on Wafers
Suchai Saksiriwatekul

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Positive Photoresist Hardening Using Formaldehyde Soak Methods
Brian E. Stricker

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The Effects of Premetalization Clean on Electromigration in Al-Si Thin Films on Si02 and Polysilicon Substrates
Peter R. Stubler

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Preliminary Formation of Deep Trench Capacitors
Christopher J. Waskiewicz