Microelectronic Engineering Conference 1990
Papers
Increasing the Practical Resolution of Projection Lithography Using a Phase-Shifting Mask
Eric M. Apelgren
Bilayer E-Beam/DUV Resist Systems
James Baccaro
Studies of Chlorinated Oxides
Jeffrey J. Ballak
Micromachining: The Fabrication of a Micromotor
Brian C. Barker
Bi-Layer Deep UV Resist System
Mark A. Boehm
Processing Techniques of MOS Capacitors
Michael D. Buczkowski
Performance Characterization of a GCA 4800 Stepper
John M. Coniff
Reactive Ion Etching of Silicon Dioxide Using Both Oxygen and Carbon Dioxide as Gas Additives
James E. Constantino
Design and Construction of a Step Etching Instrument
Robert L. Crandall
Design, Manufacture and Testing of a 4-Bit Microprocessor
Theodore D'Antonoli
Investigation of Process Induced Defects Using a LTO Process
Joseph DeSantis
Dyed Resist Study
Jennifer L. Dunbar
Selective Etching of LPCVD Si3N4 Over Si02 Using SF6
Gregg D. Espin
Polysilicon vs. Aluminum Gate PMOS Ring Oscillators
Kurt E. Gerber
A Diagnostic Test Chip for NMOS Processing
William Gross
Design and Construction of a Noncontact Resistivity Measurement Instrument
William R. Hamilton
Comparison of PMOS Transistor Source/Drain Doping: Ion Impantation Versus Solid Diffusion Source
Russell W. Heller
The Impact of Submicron 10x Reticle Defects on Images Printed with a 0.28 NA G-Line Stepper
Karl D. Hirschman
Reactive Ion Etching of Aluminum on the Plasmatrac 2406
Asadd M. Hosein
Performing C-T Measurements
James Krawiecki
GaAs MESFET Logic
Dave Petzold
Multilevel Metalization
Matthew D. Quinn
Development of a Photosensitive Polyimide Process
William Reinisch
Spin on Glass Etch Processing for the RIT NMOS Process
William Roberts
Design and Fabrication of a PN Junction Photodiode Array
Richard Rogoff
Calibration and Characterization of a Resist Process through Linewidth Measurement on Wafers
Suchai Saksiriwatekul
Positive Photoresist Hardening Using Formaldehyde Soak Methods
Brian E. Stricker
The Effects of Premetalization Clean on Electromigration in Al-Si Thin Films on Si02 and Polysilicon Substrates
Peter R. Stubler
Preliminary Formation of Deep Trench Capacitors
Christopher J. Waskiewicz