Publication Date
1990
Document Type
Paper
Abstract
Dyed and undyed AZ1512 series resists were characterized for exposure latitude, development rate, and reduction of both notching and standing waves. Uniform and patterned oxidized silicon wafers were coated with aluminum and employed as substrates for all phases of the experiment. The results show that the addition of a dye provided for the reduction of standing waves and an increase in exposure latitude. The control of reflective notching was not verified as collected data proved inconclusive.
Recommended Citation
Dunbar, Jennifer L.
(1990)
"Dyed Resist Study,"
Journal of the Microelectronic Engineering Conference: Vol. 4:
Iss.
1, Article 14.
Available at:
https://repository.rit.edu/ritamec/vol4/iss1/14