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Journal of the Microelectronic Engineering Conference
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Home > RITAMEC > Vol. 16 (2006) > Iss. 1

 

Microelectronic Engineering Conference 2006

Papers

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Development of a Bilayer Metallization for RIT's Existing CMOS Process
Anthony Nguyen

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Junction Integrity for Low Temperature Dopant Activation in Silicon
Geoff E. Watson

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Formation of Self-Aligned Shallow Junction MOSFET Source/Drains by Proximity Rapid Thermal Diffusion
Scott W. Kenny

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Fabrication and Test Characterization of Organic Poly(3,"' diallkylquaterthiophene) (PQT-12) Transistors
Amy Huang

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Solutions to Resist Pattern Collapse for 45nm Lithography
Jonathan Reese

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Fabrication of Eight Level Micro-lenses
Mayank Agrawal

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Workfunction Tuning of Molybdenum Gate by Nitrogen Incorporation (May 2006)
Kazuya Tokunaga

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BioMEMS Wireless Pressure Sensor
Daniel V. Pearce

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End Point Detection of Plasma Etching Using Optical Methods
Jeff M. Czebiniak

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Alignment in Electron Beam Lithography
Stoyan J. Jeliazkov

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Development and Characterization of a RIE Process for Anisotropic Trenches in Silicon
Dan R. Ghiocel

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Rostir, Inc.: The Fabrication of Ultra High Value chip Resistors & Business Plan Development
Jonathan E. Ross

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Microfabrication and Commercialization of a Polymer-Absorption Chemical Gas Sensor
Stephen P. Parshall

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Investigation into the Use of SU8 in High Aspect Ratio Applications
Kody Okafor

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Microfabrication of Biocompatible Stimulation Electrode Arrays for Cochlear Implants
Ward A. Johnson

 
 
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