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Authors

Mayank Agrawal

Publication Date

2006

Document Type

Paper

Abstract

As imaging and photonics technology is advancing to smaller and complex devices there is increasing interest in applications that make use of small micro-level optical elements such as micro-lenses. Micro-lens fabrication is useful in developing diffractive optical elements (DOE’s) that are used in optical communication, optical storage, optical interconnection, optical information processing and micro-optical sensors. Another area where micro-lens fabrication can be used is in characterization and optimization of illuminating sources of lithographic projection systems. The objective of this project was to fabricate eight level micro-lenses on a 5”X5” quartz substrate designed for the 193nm exposing wavelength. A micro-lens is fabricated as a Fresnel Zone Target (FZT) pattern which can be used to characterize and optimize the illuminating source of a lithographic projection system. Developing a fabrication procedure for eight level micro-lenses will be helpful for further research work in manufacturing micro-optical elements at Rochester Institute of Technology’s Semiconductor and Microsystems Fabrication Laboratory.

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