Microelectronic Engineering Conference 2003
Papers
Process Design, Development, Fabrication and Verification of a CMOS Technology for RIT
Jeremiah L. Hebding
SPICE Parameter Extraction from Simulations and Experimental Data
Robert L. Saxer Jr
Design and Fabrication of FinFETs on SOI Substrates
Steven D. Kirby
On the Influence of Surface Treatment on Electrical Characteristics of Schottky Diodes
Donald J. Hamilton
Optically Injected Circuits in a 0.18 μm CMOS
Gregory Ardault
Design and Testing of Off Axis Illumination Filters for a 248nm DUV Exposure System
Matthew E. Malloy
Design, Fabrication, and Characterization of an Alternating Phase Shifting Mask for DUV Lithography
Andrew C. Estroff
Phase Edge Contact Immersion Lithography at 193 nm
Bryan P. Watson
TiSi2 and CoSi2 Silicide Formation Using N2+ Implant
Christine Larson
Study of Nickel Silicide Processes for Advanced CMOS Applications
Branislav Curanovic
Development of a Polycrystalline Si1-xGex Gate Material by LPCVD/PVD
Michael C. Mattioli
Simulation and Modeling of a Vertical PMOS Transistor
Mufadal Arubali
Design and Fabrication of Giant Mangnetoresistance (GMR) Spin-Value Structures
Dilipkumar Mahenthiran
Characterization of Epitaxial Layer Stacking Faults
Alexa M. Perry
Gate Oxide Characterizations for Non-Planar CMOS
Keith H. Tabakman
Process Metrology for Ultrathin Gate Dielectrics
Julien Buisson
Analysis and Modeling of Polysilicon Critical Dimensions
Jasper P. Munson
Effective Generation Lifetime (τg,eff) and Surface Generation Velocity (Seff) Extractions Via Zerbst Plot Analysis
Sylvain Garaud
Auger Electron Spectroscopy Calibration
Michael David Fattu