Microelectronic Engineering Conference 2002
Papers
Investigation of Lens Aberrations Through Use of Phase Shifting Structures at 365nm Technology
James Guerrero
Interferometric Lithography Optical System Utilizing a 442nm HeCd Laser
Frank C. Cropanese
Intrafield Distortion Characterization
Brian Martinick
Raised Polysilicon Source / Drain FinFET Fabrication
Christopher T. Harvey
Analog IC Design and Fabrication
James Tom
Development of Silicon Nitride Etch Process
Robin Catalano
Silicon Dry Etch Process for Shallow Trench Isolation
Nathaniel Langdon
Development of a PECVD Tetraethylorthosilicate (TEOS) Fill Process for Shallow Trench Isolation
Erik P. Dolatowski
Fabrication and Characterization of Silicon Nitride Sacrificial replacement Gate Technology
Elias Mohammad Ullah
Low Energy Ion Implant Capabilities at RIT
Brian J. Miga
0.5 μ NMOS Devices: Process and Fabrication
Sean Houlihan
Incorporation of SPC Charts into MESA for the Subμ-CMOS Process
Kautilya Sachdeva
Integration of Low-k Dielectric with Copper
Deoram Persaud
Electron Injection By Means of a Ballistic Source
Erik M. Wheeler
Micromechanical Optical Modulator
Matt Shepard
Design and Fabrication of a Micromechanical Pressure Sensor
Neal V. Lafferty
Micro Shutters on Quartz Substrate
Vimalan Rajalingam