Microelectronic Engineering Conference 2000
Papers
A Chrome AR film for Binary Photomasks
Matthew Lassiter
Lithographic Process Evaluation by CD-SEM
Jason L. Burkholder
Investigation of Tantalum Silicon Oxide as an Attenuated Phase Shift Masking Material for 157nm Lithography
Matthew Malley
Effects of Nitrogen Implantation on Oxide Growth and Quality
Jason E. Meiring
Tantalum Pentoxide Deposition and Applications
Mark A. Bossard
Erbium-Doped Silicon Based LEDs
Joseph J. Miceli
Cobalt Silicide Formation and Patterning Technology
Neil S. Patel
Deconfounding the Effects of Cu and Cr on Perceived Fe Contamination in Si Using an SPV Technique
Steven V. Nagel
The Effect of Fluorine on Boron Diffusion
Michele Honan
RIT Process and Device Simulation with Microtec
Charles R. Overbeck
Investigation of Silicon Etching Effects for Monolithic Integration of MEMS with CMOS
Matthew J. Daniello
Copper Interconnect Development At RIT
Ashish Kushwaha
Development of LTO LPCVD Process for 6" Wafers at RIT
Karthika Sivagurunathan