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Flash EEPROM Fabrication
Keith E. Zawadzki

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Fabrication of a Three-Phase Double Polysilicon Charge Coupled Devices
Sarah Cohen

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Calibration of Process and Electrical Models for RIT Vertical NPN Bipolar Junction Transistors
Lena Zavyalova

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A Practical Porous Silicon Device Structure for Increased Electroluminescent Efficiency
D Cardarelli

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Development of a Polygate PMOS Process Compatible with Micromechanical Sensor Fabrication
Earl P. Schenck

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Formation of Sidewall Spacers and Titanium Salicide for RIT's Sub-micron CMOS
S K. Bhaskaran

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Chemical-mechanical polishing of copper with a low K Polymer interlevel dielectric
Thomas L. Brown

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Development of Bonding and Etchback Silicon on Insulator Wafers
Bobby Mozumder

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Improvement in Polysilicon etch Process for the RIT Factory
Thomas F. Flynn Jr

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Rapid Thermal Oxidation Process for 100A Si02
Mark Maslow

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Effects of Variations in RCA Clean on Breakdown Characteristics of Thin Gate Oxides
Bryan Kasprowicz

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Surface Charge Analysis (SCA) of 300 Angstrom Thermally Grown Oxides
Briand D. Handel

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Role of Hydrogen at the Si/SiO2 Interface on MOS CV Characteristics
Rahul Sachdev

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Inorganic ARC for Use in Microlithography
David J. Stern

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Investigation of New Positive and Negative Electron Beam Resists for Microlithography
Huy M. Cao

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The Effects of Contrast Enhancement Material over an Image Reversal Resist System
Richard W. Nutter IV