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The creation of MANN files, generated by computer programs, to produce other than rectangular features for the design of reticles required for the manufacturing of a micromotor has been investigated. The reticles have been designed to compensate for the lateral loss of polysilicon and silicon dioxide during the etching process and for the loss of silicon during oxidation. Three computer programs were designed to generate MANN files that would control the SCA Pattern Generator and expose emulsion coated glass plates yielding images of circles, washers, and the placement of rectangles at any orientation with respect to the center of the reticle. The reticles were developed using standard and reversal processing. The GCA MANN 4BOOSW Stepper will utilize these reticles to image wafers for the manufacture of micromotors.

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