Microelectronic Engineering Conference 1989
Papers
Second Level Alignment of the PE Model 140
Louis G. Anastos
Advances in Process Modeling at RIT SUPREM III and MINIMOS
John Bettencourt
Using the GCA 4800 DSW Wafer Stepper as a Photorepeater for the Fabrication of Chrome and Aluminum Masks
Scott M. Bruck
ECL Circuits
John J. Bush
Study of the Characteristics of Dyed Photoresist
Brad Campbell
Characterization of ARC
Cynthia A. Carr
Computer Aided Reticle Making for a Micromotor
Stephen B. Clemens
Trench Isolation Studies
John P. Curcio
Characterization of a New E-Beam Resist
Brian Fetzer
Determination of Carrier Lifetime from MOS Capacitors
Kevin R. Gratzer
Silyation of Positive Photoresist
Donald R. Koszelak
Multi-point Cleanroom Monitoring
Andrew La Pietra
Growth and Characterization of Anodic Aluminum Oxide
Cathy Leathersich
Four Bit CMOS ALU
Frank Leilich
The Characterization of an All Enhancement PMOS OP-AMP
David L. Lewis
Image Reversal Optimization and a Positive Tone Lift-Off Process with AZ5214-E Photoresist
Robert C. Lindstedt
Greedy Channel Router Implementation in FORTRAN
Ray S. Linton
Fabrication of Air-Bridges for Millimeter Wave Integrated Circuits
Antonio L. Luciani
Construction of a Quasi-Static C-V Test Station
Randall J. Mason
Design of a EEPROM Cell and Thin Oxide Evaluation
Kenneth Obuszewski
Process Development of Multilevel Metallization Utilizing National Semiconductor Polyimide El-5510
Ross Patterson
Fabrication of a single Level Metal CCD Shift Register
Paul F. Picano
nMOS Standard Cell Library
Marco Rivero
Contamination in RIT Processing
Daniel C. Shire
Plasma Damage to NMOS Capacitors
Matthew J. Strong
Investigation of LOCOS Process Using Nitrogen Implantation
Joseph W. Walters
Ion Implantation to Adjust NMOS Threshold Voltages
Matthew A. Wickham
Integrated Hall Effect Sensor
William H. Wilkinson