Publication Date
1988
Document Type
Paper
Abstract
The effect of TCA tube cleaning and oxidation on mobile ion contamination for the growth of gate oxides was Investigated. It was found that the TCA tube clean had a major effect in reduction of mobile ions, while the TCA gate oxide process employed had a negligible effect.
Recommended Citation
Fatke, David H.
(1988)
"Development and Evaluation of Chlorinated Gate Oxides,"
Journal of the Microelectronic Engineering Conference: Vol. 2:
Iss.
1, Article 11.
Available at:
https://repository.rit.edu/ritamec/vol2/iss1/11