Development of a Linear-Source, Atmospheric-Pressure RF Glow Discharge Plasma

Authors

Andrew J. Wagner

Publication Date

2008

Document Type

Paper

Abstract

A linear-source, atmospheric-pressure RF glow discharge plasma has been designed, fabricated, and analyzed. The RIT atmospheric-pressure plasma (RITAPP) consists of two parallel-plate electrodes separated by a 1.2 mm gap. Helium is flown through the gap, exiting the slit and impinging a substrate. 13.56 MHz RF power is applied to one electrode, resulting in a non-thermal plasma with a gas temperature (T_g) between 50 and 150 °C. Optical emission spectroscopy was used to determine spectral radiation in the UV-Vis region of helium and helium/oxygen plasmas. Singlet and triplet helium emissions as well as numerous 0, H, and OH peaks are observed. Surface treatment of bare 2” (100) p-type silicon wafers was performed by short exposure to a He/O₂ plasma exposure increased surface energy, creating a hydrophilic surface. 20-minute exposures of bare and RCA-cleaned silicon substrates to a He/O₂ plasma were analyzed using ellipsometry and mercury probe C-V measurements. Optical thickness was determined to be 3.4 nm while C-V measurements revealed that both the plasma-grown oxide and the chemical oxides exhibited enhanced dielectric properties following treatment. Work is ongoing to expand upon oxidation experiments as well as I-V diagnostics of the plasma. In addition, investigation of low-temperature carbon nanotube growth is underway.

Recommended Citation

Wagner, Andrew J. (2008) "Development of a Linear-Source, Atmospheric-Pressure RF Glow Discharge Plasma," Journal of the Microelectronic Engineering Conference: Vol. 17: Iss. 1, Article 22.
Available at: https://repository.rit.edu/ritamec/vol17/iss1/22