The objective of this experiment is to obtain an endpoint detection unit that can be used on all plasma etch tools in the Semiconductor and Microsystems Fabrication Laboratory (SMFL). This investigation examined one of the most common methods for end point detection in plasma etching; optical emission spectroscopy. Optical emission spectroscopy involves monitoring the wavelength emission intensity of the plasma of different species within the etchant plasma. From all of the data collected in this experiment it was shown that the Ocean Optics Spectrometer can be utilized for end point detection on any toolset in the SMFL.
Czebiniak, Jeff M.
"End Point Detection of Plasma Etching Using Optical Methods,"
Journal of the Microelectronic Engineering Conference: Vol. 16:
1, Article 9.
Available at: https://repository.rit.edu/ritamec/vol16/iss1/9