A mesoscopic magnetic beam contained in a silicon frame attached to the bulk of a silicon wafer with pivoting hinges will be used to show the affects of magnetic fields on movable magnetic structures. The pivoting hinges will be etched out of silicon using a Deep Reactive Ion Etcher (DRIE) system and the dimensions of the hinges will determine the force required to deflect the beam. Below each end of the beam will be large copper inductor coils fabricated on a separate wafer. When a current is applied to the coil, the magnetic field generated will attract the beam towards it. The critical component of the pivoting magnetic structure will be the silicon frame that supports the magnetic material.
Fino, Gary A.
"Fabrication of a Magnetically Actuated Torsional Beam,"
Journal of the Microelectronic Engineering Conference: Vol. 14:
1, Article 19.
Available at: https://repository.rit.edu/ritamec/vol14/iss1/19