Silica Waveguide Design and Fabrication using Integrated Optics: A Link to Optical VLSI Photonics Integration for Semiconductor Technology

Authors

Anthony G. Navarro

Publication Date

2004

Document Type

Paper

Abstract

The hardmask NiCr, has shown to be the optimum alloy in reducing sidewall roughness (SWR) in planar waveguide geometries. Within this study, the NiCr hardmask has been demonstrated using a lift-off of NiCr. In comparison, a NiCr etchant from TranseneT~t is used to compare how well sidewall roughness is reduced, and how the RIE - CHF₃/O₂ gas mixture improved anisotropy. From the results obtained, NiCr is a robust material that reduces sidewall roughness, and is the best metal to use, with the least amount of transferred striations. The CHF₃/CF₄ gas mixture in the AME -P5000 RIE tool proved to have better anisotropy and selectivity with respect to TEOS/Si₃N₄/Thermal Oxide {5000 A layer} respectively.

Recommended Citation

Navarro, Anthony G. (2004) "Silica Waveguide Design and Fabrication using Integrated Optics: A Link to Optical VLSI Photonics Integration for Semiconductor Technology," Journal of the Microelectronic Engineering Conference: Vol. 14: Iss. 1, Article 13.
Available at: https://repository.rit.edu/ritamec/vol14/iss1/13