Abstract
Tunnel field-effect transistors (TFETs) have long been considered as a replacement technology for metal-oxide-semiconductor field-effect transistors in low power digital applications due to their low OFF-current and small subthreshold swing. These benefits are somewhat neutralized by the low ON-current exhibited by TFETs fabricated with large bandgap semiconductors such as silicon. To offset this drawback, different material systems can be used, with material optimization required for the channel material, the gate stack, and their corresponding geometries. This study considers the novel idea of using 2-dimensional (2D) semiconductors for the channel material in TFETs, and the potential effects of such a channel on the physics of the resulting device. After this theoretical discussion of TFETs, the simulation requirements of such a device are introduced as well as the two quantum simulation systems of choice: the Vienna Ab initio Simulation Package (VASP 5.4) as offered by Materials Design and NanoHUB's NEMO5. Topics examined with simulation theory in mind include the density functional theorem (DFT) and convergence criteria. Previously fabricated Esaki diodes from Pawlik et al. are simulated using NEMO5 and the necessity of bowing application to the tight-binding parameters is shown. Tables clarifying the tight-binding parameters of InGaAs from the NEMO5 all.mat file and their associated bowing parameters are included. The simulations performed with the bowing parameters included are shown to match the experimental data almost exactly. Initial VASP 5.4 simulations for GaAs and InAs are shown and the practicality of DFT using the generalized gradient approximation (GGA), HSE06 with GGA, and Hartree-Fock methods is discussed; HSE06 with GGA is shown to produce simulations closest to reality, though there is a signicant computation time trade-off. A designed experiment varying the lattice constants of MoS2 and WTe2 is performed and included as an example of the simulation systems capabilities. A plot of VASP 5.4 and NEMO5 MoS2 bandstructure results is also included.
Library of Congress Subject Headings
Tunnel diodes--Computer simulation; Tunnel field-effect transistors--Computer simulation; Tunnel field-effect transistors--Materials
Publication Date
7-19-2018
Document Type
Thesis
Student Type
Graduate
Degree Name
Microelectronic Engineering (MS)
Department, Program, or Center
Microelectronic Engineering (KGCOE)
Advisor
Sean L. Rommel
Advisor/Committee Member
James E. Moon
Advisor/Committee Member
Santosh Kurinec
Recommended Citation
Cadareanu, Patsy, "A Quantum Simulation Study of III-V Esaki Diodes and 2D Tunneling Field-Effect Transistors" (2018). Thesis. Rochester Institute of Technology. Accessed from
https://repository.rit.edu/theses/9899
Campus
RIT – Main Campus
Plan Codes
MCEE-MS