Abstract
A survey of optical properties of sputtered materials in the spectral range of 145 nm to 800 nm has been performed. The optical constants n and k have been measured using ellipsometric techniques. Four combination materials have been created with the properties suitable for application in Attenuated Phase Shift Mask (APSM) manufacturing. The four combination materials have also been characterized, with the results presented.
Library of Congress Subject Headings
Small business--Environmental aspects; Production management--Environmental aspects; Business enterprises--Environmental aspects; ISO 14001 Standard
Publication Date
1-2003
Document Type
Thesis
Student Type
Graduate
Department, Program, or Center
Microelectronic Engineering (KGCOE)
Advisor
Bruce W. Smith
Advisor/Committee Member
Dale Ewbank
Advisor/Committee Member
Michael Jackson
Recommended Citation
Bourov, Anatoly, "Optical properties of materials for 157 nm lithography" (2003). Thesis. Rochester Institute of Technology. Accessed from
https://repository.rit.edu/theses/8382
Campus
RIT – Main Campus
Comments
Physical copy available from RIT's Wallace Library at HD30.255 .K43 2003