Since the mid 1960's there have been numerous papers published on the modification of organic polymers in a pure oxygen or oxygen-f luorocarbon plasma. In terms of this thesis, chemical modification occurs when a polymer is either passivated (fluorinated) or etched. Many parameters influence the degree to which a polymer is modified downstream of a microwave (MW) plasma. Some of the parameters include: substrate temperature, MW power, gas feed composition, chamber pressure and total gas flow rate; the latter two determine the gas flow velocity. One of the more important parameters, in the case of polyimide (PI), which influences etching, is the [0]/[F] ratio. That is. the ratio between the atomic oxygen concentration and the atomic fluorine concentration. [1,2,3]

Library of Congress Subject Headings

Polymers--Research; Plasma chemistry; Plasma etching; Fluorine

Publication Date


Document Type


Department, Program, or Center

School of Chemistry and Materials Science (COS)


Lakaez, Gerald

Advisor/Committee Member

Clark, Robert


Note: imported from RIT’s Digital Media Library running on DSpace to RIT Scholar Works. Physical copy available through RIT's The Wallace Library at: QD381.8 .K875 1989


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