Abstract
The object of this project is to study the electret properties of silicon dioxide coating. Silicon dioxide coatings were produced by microwave plasma chemical vapor deposition under various conditions such as pressure, flow ratio, power, etc.. DC bias, thermionic emission and corona charge were used to produce charges in the silicon dioxide film. The results include measurements of deposition rate of silicon dioxide, the absorption wavenumbers, the thickness and index of silicon dioxide coating. The electret properties were focused on the charging process, charge distribution and charge decay rate.
Library of Congress Subject Headings
Electrets; Plasma-enhanced chemical vapor deposition; Silica
Publication Date
11-1-1993
Document Type
Thesis
Department, Program, or Center
Electrical Engineering (KGCOE)
Advisor
Ramanan, Sannasi
Recommended Citation
Lin, Xiaorong, "The use of plasma-generated silicon dioxide-like coatings as charge storage media for electrets" (1993). Thesis. Rochester Institute of Technology. Accessed from
https://repository.rit.edu/theses/5616
Campus
RIT – Main Campus
Comments
Note: imported from RIT’s Digital Media Library running on DSpace to RIT Scholar Works. Physical copy available through RIT's The Wallace Library at: QC585.8.E4 L56 1993