Abstract
A linewidth measurement system has been developed which incorporates a coherent laser microspot with a piezo flexure-pivot translational stage. A line is scanned beneath the microspot and reflected energy collected with an on axis geometry normal to the wafer. Position versus reflectance data are presented for lines patterned in thick and thin oxide films on I.e. wafers.
Library of Congress Subject Headings
Photographic optics
Publication Date
7-1-1981
Document Type
Thesis
Department, Program, or Center
School of Photographic Arts and Sciences (CIAS)
Advisor
Nyyssonen, Diana
Recommended Citation
Pomerene, Andrew, "Coherent optical linewidth measurement of thick films on integrated circuit wafers" (1981). Thesis. Rochester Institute of Technology. Accessed from
https://repository.rit.edu/theses/5256
Campus
RIT – Main Campus
Comments
Note: imported from RIT’s Digital Media Library running on DSpace to RIT Scholar Works in December 2013.
Physical copy available from RIT's Wallace Library at TR220 .P65