Abstract

A study of stress birefringence in models of pellicles has been conducted. Models have been examined in terms of their isochromatic lines of stress. The intensity variations in exposure due to these lines has been characterized for a pellicle model under diametral compression. It has been found that exposure variation due to pellicle stress birefringence is below one percent.

Library of Congress Subject Headings

Photography--Exposure; Photoelasticity; Refraction, Double

Publication Date

5-1-1984

Document Type

Thesis

Department, Program, or Center

School of Photographic Arts and Sciences (CIAS)

Advisor

Nilsen, Chris

Advisor/Committee Member

Wertheimer, Alan

Comments

Note: imported from RIT’s Digital Media Library running on DSpace to RIT Scholar Works. Physical copy available through RIT's The Wallace Library at: TR591.M64 1984

Campus

RIT – Main Campus

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