Using edge gradient analysis on chrome and emulsion photomasks to determine the modulation transfer function of a mask making system proved to be limited by the method in which the edge gradients were observed. Scanning electron micrographs were taken of the chrome and emulsion edges on various masks, and results showed that chrome photosmasks exhibit steeper gradients and better edge acuity than emulsion images. However, due to the ratio of line size to gradient size on each of the types of masks, it was decided that the gradient would not make a significant contribution to modulation loss in the image.

Library of Congress Subject Headings

Integrated circuits--Masks--Analysis; Optical transfer function; Masks (Electronics)

Publication Date


Document Type


Department, Program, or Center

School of Photographic Arts and Sciences (CIAS)


Names Illegible


Note: imported from RIT’s Digital Media Library running on DSpace to RIT Scholar Works. Physical copy available through RIT's The Wallace Library at: TK7874.L397 1985


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