Abstract

An important goal of the microelectronics industry is to make new technological advances while keeping the cost of the fabrication process down. To achieve this goal, the microelectronics industry are presently placing more active devices on each chip, while at the same time trying to increase the number of successful chips per wafer. In order for the industry to successfully do this, they must reduce all of the dimensions in the circuit while trying to maintain its physical, chemical, and functional properties. These demands have made all steps of the fabrication process more critical. The scope of this project will encompass the development of exposed positive photoresist with an emphasis placed upon the effects of agitation on resist image quality.

Library of Congress Subject Headings

Microelectronics; Images, Photographic; Photoresists

Publication Date

4-15-1983

Document Type

Thesis

Department, Program, or Center

School of Photographic Arts and Sciences (CIAS)

Advisor

Hayhaim, Cewrey

Comments

Note: imported from RIT’s Digital Media Library running on DSpace to RIT Scholar Works. Physical copy available through RIT's The Wallace Library at: TK7874.M52 1983

Campus

RIT – Main Campus

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