Abstract
Experiments were done to reduce the influence of unwanted X-ray exposures on Kodak Plus-X film. Variations of surface developer components showed no favorable results. The concentration of KBr was varied up to 10 grams per liter with again, no favorable results. The incorperation of benzitriazole decreased base plus fog from values of .81 to .56 with a significant decrease in speed. Phenyl mercaptotetrazole was extreamly effective in decreasing both base plus fog and speed.
Library of Congress Subject Headings
Photographic chemistry; Photography--Developing and developers
Publication Date
5-15-1979
Document Type
Senior Project
Student Type
Undergraduate
Degree Name
Photographic and Imaging Technology (BS)
Department, Program, or Center
School of Photographic Arts and Sciences (CIAS)
Advisor
Francis, Ronald
Recommended Citation
Rudolph, Michael L., "Minimization of Unwanted X-Ray Exposures on Conventional Photographic Films by Developer Modification" (1979). Thesis. Rochester Institute of Technology. Accessed from
https://repository.rit.edu/theses/5152
Campus
RIT – Main Campus
Comments
Note: imported from RIT’s Digital Media Library running on DSpace to RIT Scholar Works. Physical copy available through RIT's The Wallace Library at: TR210.R82