Abstract

The spectral sensitivity of KODAK Micro Positive Resist 820 has been determined for the spectral range of 300nm to 500nm. A xenon-source monochrometer was used in a hard contact exposing system. Se/isitivity is defined as the inverse of the exposure (mj/cm ) needed to produce an image in a photoresist coated plate having walls of 70 normal slope. Low intensity reciprocity law failure has been conclusively shown to exist in this resist with exposure intensities of 100 mw/cm and below. Guide lines have been drawn up, based on the procedures and results of the experimentation, to assist photoresist users in determining the spectral sensitivity of a photoresist. The feasibility of these procedures has been determined to be positive.

Library of Congress Subject Headings

Semiconductors; Photoresists; Microelectronics

Publication Date

4-15-1983

Document Type

Thesis

Department, Program, or Center

School of Photographic Arts and Sciences (CIAS)

Advisor

Francis, Ronald

Comments

Note: imported from RIT’s Digital Media Library running on DSpace to RIT Scholar Works. Physical copy available through RIT's The Wallace Library at: TK7871.85.H72 1983

Campus

RIT – Main Campus

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