Abstract

A Perkin-Elmer Micralign 230 Exposure Tool was used in an analysis of magnification variation. In the analvsis, all elements were kept constant except for the repositioning of the mask between sets of wafers that were exposed. Repositioning was initiated by removal and replacement of the mask from the exposure tool and the mask holder. Overlay measurements were then taken from the exposed wafers. These measurements were used to calculate the amount of magnification error of the images found on the wafers. These magnification values verified the hypothesis that repositioning of the mask has a significant effect on magnification values.

Library of Congress Subject Headings

Photomicrography

Publication Date

4-15-1983

Document Type

Thesis

Department, Program, or Center

School of Photographic Arts and Sciences (CIAS)

Advisor

Francis, Ronald

Advisor/Committee Member

Names Illegible

Comments

Note: imported from RIT’s Digital Media Library running on DSpace to RIT Scholar Works. Physical copy available through RIT's The Wallace Library at: QH251.D64 1983

Campus

RIT – Main Campus

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