Abstract
An attempt was made to obtain a set of spatial transfer functions which would allow the prediction of output effective exposure distributions for a nonlinear lithographic film system. Slit exposures were used as one-dimensional system inputs. It was proposed that the use of slits would allow the calculation of a general system transfer function to be simplified. The mathematical model chosen to describe this nonlinear transfer was shown to be invalid due to the nonlinear relationship of small area system gain (small area output effective exposure divided by the input exposure) as a function on input exposure. The model,, based on a condensation of the multidimensional MacLaurin series, required this relationship to be linear. Data obtained from the small area effective exposure distributions allowed the calculation of a small area semi-specular density vs. relative log exposure curve. There existed a dramatic reduction in contrast for the small area curve as compared with the large area characteristics of the lithographic film system.
Library of Congress Subject Headings
Images, Photographic
Publication Date
2-1-1981
Document Type
Thesis
Student Type
Graduate
Department, Program, or Center
School of Photographic Arts and Sciences (CIAS)
Advisor
Abouelata, Mohamed
Advisor/Committee Member
Carson, John
Advisor/Committee Member
Rickmers, Albert
Recommended Citation
Holbrook, David S., "An investigation of a mathematical model to characterize the nonlinear nature of a lithographic film system" (1981). Thesis. Rochester Institute of Technology. Accessed from
https://repository.rit.edu/theses/4900
Campus
RIT – Main Campus
Comments
Note: imported from RIT’s Digital Media Library running on DSpace to RIT Scholar Works in December 2013. Physical copy available through RIT's The Wallace Library at: TR222.H64