Abstract

Experiments were performed on the deposition of both diamond crystals and films from hydrogen and methane gas mixtures on silicon and polymer substrates by various plasma enhanced chemical vapor deposition techniques (PECVD) . Microwave, arc, and dc plasmas to assist the deposition of the diamond metastable phase of carbon were used. Discussed in the following thesis are the plasma configurations used together with experimental parameters such as gas composition, flow rate, chamber pressure, and power. The crystallinity of the films, which can be controlled and changed from polycrystalline to amorphous, was ascertained by scanning electron microscopy (SEM) . Other characterization techniques employed were profilometry to indicate uniformity, depth profiles and growth rates, and Raman spectroscopy which depicted chemical structure.

Library of Congress Subject Headings

Diamonds, Artificial; Diamond thin films; Plasma-enhanced chemical vapor deposition

Publication Date

8-1-1990

Document Type

Thesis

Student Type

Graduate

Department, Program, or Center

School of Chemistry and Materials Science (COS)

Advisor

Not listed

Comments

Note: imported from RIT’s Digital Media Library running on DSpace to RIT Scholar Works in December 2013. Physical copy available through RIT's The Wallace Library at: TP873.5.D5 F73 1990

Campus

RIT – Main Campus

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