Abstract
None provided.
Library of Congress Subject Headings
Plasma etching; Plasma (Ionized gases)--Testing
Publication Date
6-1-1986
Document Type
Thesis
Department, Program, or Center
Center for Materials Science and Engineering
Advisor
Vukanovic, Vladimir
Advisor/Committee Member
Takacs, Gerald
Recommended Citation
Matuszak, Edward, "Etching and Passivation Downstream of an O2-CF4-Ar Microwave Plasma" (1986). Thesis. Rochester Institute of Technology. Accessed from
https://repository.rit.edu/theses/2784
Campus
RIT – Main Campus
COinS
Comments
Note: imported from RIT’s Digital Media Library running on DSpace to RIT Scholar Works. Physical copy available through RIT's The Wallace Library at: QC718.5.P55 M37 1986