Publication Date
1991
Document Type
Paper
Abstract
Local stress field determination by means of free standing structures was investigated. The process for manufacturing these structures was developed and used to study the stress in polysilicon films.. For a 1.5um polysilicon film, the stress was determined to be less than 6.77e8Dynes/cm2. For a 0.5um polysilicon films, the stress was found to be 4. O9e8Dynes/cm2.
Recommended Citation
Maghsoudnia, Pirouz
(1991)
"Local Stress Field Determination for Thin Polysilicon Films,"
Journal of the Microelectronic Engineering Conference: Vol. 5:
Iss.
1, Article 15.
Available at:
https://repository.rit.edu/ritamec/vol5/iss1/15