Publication Date
4-2019
Document Type
Poster
Recommended Citation
Habib, Sudmun
(2019)
"Etching process characterization of nitride and polysilicon layer using trionIII Etcher,"
Journal of the Microelectronic Engineering Conference: Vol. 25:
Iss.
1, Article 9.
Available at:
https://repository.rit.edu/ritamec/vol25/iss1/9