Publication Date
2019
Document Type
Presentation
Recommended Citation
Habib, Sudmun
(2019)
"ETCHING PROCESS CHARACTERIZATION OF NITRIDE LAYER AND POLY SILICON LAYER USING TRION III ETCHER,"
Journal of the Microelectronic Engineering Conference: Vol. 25:
Iss.
1, Article 10.
Available at:
https://repository.rit.edu/ritamec/vol25/iss1/10
