This project follows the design of the full timeline of an equipment installation in a microelectronics cleanroom, from developing an understanding of the tool through preparation of facilities, installation of the tool, and setup for use. The tool installed is a Plasmatherm Apex SLR Inductively-Coupled Plasma (ICP) Etcher manufactured by Advanced Vacuum. This tool was purchased by an RIT professor for ICP etching on III-V substrates, a new capability for the RIT SMFL. Installed additionally are the auxiliary equipment units, including two chillers, a Gas Reactor Column (GRC), and a roughing pump. The operation of the main tool for processing is analyzed as well as the roles that the auxiliary equipment play in operation of the system as a whole. Facilities needs such as electricity, process gases, cooling water, and exhaust are assessed, and their installation described. The process of decommissioning a Perkin-Elmer 2400 sputtering tool and the movement and refurbishing of a Consolidated Vacuum Corporation (CVC) Metal Evaporator are also detailed as necessary steps in preparing the RIT SMFL for the installation of the new ICP Etcher.
"Installation and Operation of an Inductively-Coupled Plasma (ICP) Etcher,"
Journal of the Microelectronic Engineering Conference: Vol. 24:
1, Article 7.
Available at: https://repository.rit.edu/ritamec/vol24/iss1/7