Publication Date
2018
Document Type
Presentation
Recommended Citation
Judd, Jesse
(2018)
"Fabrication and Characterization of High-k Al2O3 and HfO2 Capacitors,"
Journal of the Microelectronic Engineering Conference: Vol. 24:
Iss.
1, Article 30.
Available at:
https://repository.rit.edu/ritamec/vol24/iss1/30
