Publication Date
5-8-2017
Document Type
Presentation
Recommended Citation
Gonta, Casey J.
(2017)
"Atomic Layer of Deposition of Ferroelectric HfO2,"
Journal of the Microelectronic Engineering Conference: Vol. 23:
Iss.
1, Article 11.
Available at:
https://repository.rit.edu/ritamec/vol23/iss1/11