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Microelectromechanical systems (MEMS) have gained increasing importance in the semiconductor industry. The research done had three main goals. The first was to pattern a corrugated pattern in photoresist. The second was to obtain a variation in the stress of the materials used and the third was to fabricate a micro. The micro shutter is constructed using a stack consisting of Amorphous Carbon and Aluminum and is anchored at one end to the substrate. In this study two of the three goals were met however there were some difficulties with the fabrication of the micro shutter that will be discussed later on.

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