Nonlinear Photon Pair Generation in a Highly Dispersive Medium

Authors

David J. Starling, Pennsylvania State University
Jacob Poirier, Rochester Institute of TechnologyFollow
Michael Fanto, Rochester Institute of TechnologyFollow
Jeffrey A. Steidle, Rochester Institute of TechnologyFollow
Christopher C. Tison, Air Force Research Laboratory
Gregory A. Howland, Rochester Institute of TechnologyFollow
Stefan F. PrebleFollow

Abstract

Photon pair generation in silicon photonic integrated circuits relies on four wave mixing via the third order nonlinearity. Due to phase matching requirements and group velocity dispersion, this method has typically required TE polarized light. Here, we demonstrate TM polarized photon pair production in linearly uncoupled silicon resonators with more than an order of magnitude more dispersion than previous work. We achieve measured rates above 2.8 kHz and a heralded second order correlation of . This method enables phase matching in dispersive media and paves the way for novel entanglement generation in silicon photonic devices

Publication Date

4-29-2020

Comments

This is a pre-print, the final, published version is located here: https://doi.org/10.1103/PhysRevApplied.13.041005

Document Type

Article

Department, Program, or Center

School of Physics and Astronomy (COS)

Recommended Citation

Starling, David J.; Poirier, Jacob; Fanto, Michael; Steidle, Jeffrey A.; Tison, Christopher C.; Howland, Gregory A.; and Preble, Stefan F., "Nonlinear Photon Pair Generation in a Highly Dispersive Medium" (2020). Physical Review Applied, 13 (41005), 1-5. Accessed from
https://repository.rit.edu/article/1956

Campus

RIT – Main Campus