Synthesis of UV-Blocking Titanium Oxide Films via Remote-Type Atmospheric Pressure Plasma CVD

Authors

Hayate Endo, DaikyoNishikawaFollow
Akira Shirakura, Keio UniversityFollow
Shinya Kudo, Keio　UniversityFollow
Tetsuya Suzuki, Keio universityFollow

Creative Commons License

This work is licensed under a Creative Commons Attribution 4.0 International License.

Abstract

This study aims to enhance UV resistance in plastics, focusing on polycarbonate (PC) and polypropylene (PP) commonly used in reuseable packaging. Traditional organic UV absorbers face safety and cost challenges, prompting our investigation into alternative methods. We utilized chemical vapor deposition (CVD), specifically Atmospheric Pressure Plasma Enhanced CVD (AP-PE-CVD), to apply titanium oxide (TiO₂) thin films. This innovative approach, using a remote-type AP-PE-CVD technique, enables coating on complex surfaces and 3D objects. The produced TiO2 films, containing over 20% titanium, showed a UV transmittance of 14.5% at 310 nm and effective UV blocking starting at 372 nm. The process, operating at ambient conditions with argon as the carrier gas, is highly suitable for mass production. The results of this research study demonstrate the potential of this technology in developing UV-protection coatings for a variety of materials, offering significant benefits for use with various plastics that were studied.

Recommended Citation

Endo, Hayate; Shirakura, Akira; Kudo, Shinya; and Suzuki, Tetsuya (2024) "Synthesis of UV-Blocking Titanium Oxide Films via Remote-Type Atmospheric Pressure Plasma CVD," Journal of Applied Packaging Research: Vol. 16: No. 1, Article 2.
Available at: https://repository.rit.edu/japr/vol16/iss1/2