Christine Mee


A study was performed to develop an accurate, on-line method of determining the cuprous chloride concentration in a typical cupric chloride etcher. A technique was developed using the slope between two spectrophotometric absorption points produced by scanning a solution sample. An on-line monitor was developed to produce a faster and more accurate method of solution concentration control for a typical cupric chloride etching solution. Slope increased linearly with increasing cuprous concentration when the 535 and 560 nanometer bandwidth filter combination was used. Monitor accuracy was found to be independent of cupric concentration, hydrochloric acid concentration, and temperature over the cuprous concentration range of interest which extends from zero to twenty grams per liter.

Library of Congress Subject Headings

Etching reagents; Printed circuits; Electronic apparatus and appliances

Publication Date


Document Type


Department, Program, or Center

School of Photographic Arts and Sciences (CIAS)


Merinreli, P.


Note: imported from RIT’s Digital Media Library running on DSpace to RIT Scholar Works. Physical copy available through RIT's The Wallace Library at: TP156.E68M44 1986


RIT – Main Campus