Alumina (Al2O3) thin films are used in anti-reflection and high reflection mirror coatings from deep UV to near infrared. The optical, mechanical, and structural properties of films are dependent on the deposition technique and the desired film performance can be achieved by manipulating the deposition parameters. Such deposition parameters are substrate temperature, deposition rate, and oxygen partial pressure. For laser mirror performance applications, it is desirable to optimize the films with regards to laser damage threshold and film stress. To these ends, this thesis work studies Al2O3 thin films synthesized with electron beam evaporation technique as a function of oxygen partial pressure. As the oxygen partial pressure increases the laser damage resistance improves with the film absorption in UV region. At the same time, the residual stress is observed to shift towards less tensile stress, likely due to water absorption. Additionally, the study included the optical performance of Al2O3 monolayer films, showing the refractive index decreases with increasing oxygen pressure.

Library of Congress Subject Headings

Thin films--Materials; Aluminum oxide--Optical properties; Aluminum oxide--Mechanical properties; Oxygen--Industrial applications; Lasers--Mirrors

Publication Date


Document Type


Student Type


Degree Name

Materials Science and Engineering (MS)

Department, Program, or Center

School of Chemistry and Materials Science (COS)


Michael Pierce

Advisor/Committee Member

Santosh Kurinec

Advisor/Committee Member

Karl Hirschman


RIT – Main Campus

Plan Codes